
Guide for Design of Flat, Straight-Line Test Structures for Detecting Metallization Open-Circuit or Resistance-Increase Failure Due to Electromigration
NORM herausgegeben am 1.1.1989
Bezeichnung normen: ASTM F1259-89
Anmerkung: UNGÜLTIG
Ausgabedatum normen: 1.1.1989
Zahl der Seiten: 2
Gewicht ca.: 6 g (0.01 Pfund)
Land: Amerikanische technische Norm
Kategorie: Technische Normen ASTM
Keywords:
Accelerated aging/testing-semiconductors, Defects-semiconductors, Electrical conductors-semiconductors, Electromigration, Failure end point-electronic components/devices, Metallization, Microelectronic device processing, Resistance-failure, Silicon-semiconductor applications, Straight-line testing, Test structures, Time to failure, Voltage, design of flat straight-line test structures (for detecting, metallization open-circuit/resistance to increase failure due to, electromigration), guide