Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)
NORM herausgegeben am 1.6.2011
Bezeichnung normen: ASTM F2113-01(2011)
Anmerkung: UNGÜLTIG
Ausgabedatum normen: 1.6.2011
Zahl der Seiten: 2
Gewicht ca.: 6 g (0.01 Pfund)
Land: Amerikanische technische Norm
Kategorie: Technische Normen ASTM
Keywords:
electronics, purity analysis, purity grade, sputtering, target, thin film, Electronic thin-film applications, High-purity metallic sputtering targets, Impurities--electronic materials/applications, Semiconductor device testing, Sputtering process/targets, Target specifications, Thin film applications, ICS Number Code 29.045 (Semiconducting materials)