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GB/T 14847-2010

Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance

NORM herausgegeben am 10.1.2011

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The information about the standard:

Designation standards: GB/T 14847-2010
Publication date standards: 10.1.2011
Country: Chinese technical standard
Kategorie: Technische Normen GB