Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
NORM herausgegeben am 31.12.2021
Designation standards: GB/T 41064-2021
Publication date standards: 31.12.2021
Country: Chinese technical standard
Kategorie: Technische Normen GB