
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
NORM herausgegeben am 21.11.2022
Bezeichnung normen: ISO 14606:2022-ed.3.0
Ausgabedatum normen: 21.11.2022
Zahl der Seiten: 17
Gewicht ca.: 51 g (0.11 Pfund)
Land: Internationale technische Norm
Kategorie: Technische Normen ISO
Description / Abstract: This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.