Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
NORM herausgegeben am 18.5.2004
Bezeichnung normen: ISO 17331:2004
Ausgabedatum normen: 18.5.2004
Zahl der Seiten: 18
Gewicht ca.: 54 g (0.12 Pfund)
Land: Internationale technische Norm
Kategorie: Technische Normen ISO
Description / Abstract: ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.