ISO 23170:2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

NORM herausgegeben am 15.6.2022

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The information about the standard:

Designation standards: ISO 23170:2022
Publication date standards: 15.6.2022
The number of pages: 29
Approximate weight : 87 g (0.19 lbs)
Country: International technical standard
Kategorie: Technische Normen ISO

Annotation of standard text ISO 23170:2022 :

Description / Abstract: This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).